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The preparation of superhydrophobic surfaces of hierarchical silicon nanowire structures

机译：分层硅纳米线结构的超疏水表面的制备

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Superhydrophobic surfaces are prepared by fabricating silicon nanowires to enhance the surface roughness and then modifying the chemical nature of the surface with a self-assembled octadecyltrichlorosilane monolayer to lower the surface energy. All the processes are performed near room temperature. The dynamic contact angle data demonstrate that the water droplet on these surfaces of nanowires can exhibit a transition from the Wenzel state to the Cassie state by simply controlling the etching time. The hierarchical structure is constructed by fabricating the nanopillars (i.e. nanowires) on top of the regular pillar-like silicon wafers. As a consequence, superhydrophobicity could be achieved much more effectively by applying the hierarchical structure.
机译：通过制造硅纳米线以提高表面粗糙度，然后用自组装的十八烷基三氯硅烷单层改变表面的化学性质以降低表面能来制备超疏水表面。所有过程均在室温附近进行。动态接触角数据表明，通过简单地控制蚀刻时间，纳米线这些表面上的水滴可以表现出从Wenzel状态到Cassie状态的转变。通过在规则的柱状硅晶片的顶部上制造纳米柱（即，纳米线）来构造分层结构。结果，通过应用分级结构可以更有效地实现超疏水性。

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