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Inverted hemispherical mask colloidal lithography

机译:倒半球掩模胶体光刻

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This paper presents a cost-effective nanofabrication method for forming large area and high coverage two-dimensional metal nanostructures on flat and curved surfaces. This method starts with a periodic array of hemispherical dimples on polystyrene (PS) film prepared by colloidal lithography with a sacrificial layer of polyacrylic acid (PAA) underneath. After the removal of PAA in water solution, the PS layer is turned over and attached to the substrate to be patterned. An inverted hemispherical mask is formed after oxygen plasma etching. As the holes at the bottom are much larger than those on the surface, the mask is especially suitable for a standard lift-off process. Based on this mask, metal nano-disk and pair-disk arrays, as well as two-dimensional nanostructures on a curved surface, have been fabricated. Optical measurement shows that a surface plasmon resonance exists in a periodic disk array. This method is valuable for the fabrication of a magnifying metamaterial hyperlens in order to eliminate the limitation of optical diffraction.
机译:本文提出了一种在平面和曲面上形成大面积,高覆盖率的二维金属纳米结构的经济有效的纳米加工方法。该方法从在胶体光刻法制备的聚苯乙烯(PS)薄膜上周期性排列半球形凹痕开始,在其下方有一层牺牲性的聚丙烯酸(PAA)层。在除去水溶液中的PAA之后,将PS层翻转并附着到要构图的基板上。在氧等离子体蚀刻之后形成倒半球掩模。由于底部的孔比表面上的孔大得多,因此该面罩特别适合于标准剥离工艺。基于该掩模,已经制造了金属纳米盘和成对盘阵列以及弯曲表面上的二维纳米结构。光学测量表明,在周期盘阵列中存在表面等离子体共振。这种方法对于制造放大的超材料超透镜以消除光学衍射的限制是有价值的。

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