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首页> 外文期刊>Nanotechnology >Microstructure and optical properties of ultra-thin zirconia films prepared by nitrogen-assisted reactive magnetron sputtering
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Microstructure and optical properties of ultra-thin zirconia films prepared by nitrogen-assisted reactive magnetron sputtering

机译：氮辅助反应磁控溅射制备超薄氧化锆薄膜的微观结构和光学性质

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摘要

High-k ZrO_2 films were prepared by nitrogen-assisted direct current reactive magnetron sputtering on n-type silicon (100). The microstructure and optical properties in relation to thermal budgets were investigated. X-ray photoelectron spectroscopy (XPS) was used to determine the chemical states. Atomic force microscopy (AFM) analysis indicated that the annealing temperature had significant effects on surface roughness. By using Fourier transform infrared spectroscopy (FTIR), the resistance to the interface growth after the additional thermal budgets was observed. The thickness and pseudodielectric constants of ZrO_2 thin films correlating to annealing temperature were determined by Tauc-Lorentz spectroscopic ellipsometry (SE) dispersion model fitting. Optical band gaps (E_g) were also obtained based on the extracted absorption edge.
机译：通过在n型硅（100）上进行氮气辅助的直流反应磁控溅射制备了高k ZrO_2薄膜。研究了与热收支有关的微观结构和光学性质。 X射线光电子能谱（XPS）用于确定化学状态。原子力显微镜（AFM）分析表明，退火温度对表面粗糙度有显着影响。通过使用傅立叶变换红外光谱（FTIR），观察到在额外的热预算后界面生长的阻力。通过Tauc-Lorentz光谱椭偏仪（SE）色散模型拟合确定与退火温度相关的ZrO_2薄膜的厚度和伪介电常数。还基于提取的吸收边缘获得了光学带隙（E_g）。

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