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Micromachined silicon transmission electron microscopy grids for direct characterization of as-grown nanotubes

机译：微机械加工的硅透射电子显微镜格栅，用于直接表征生长中的纳米管

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摘要

Transmission electron microscopy (TEM) is a key technique in the structural characterization of carbon nanotubes. For device applications, carbon nanotubes are typically grown by chemical vapour deposition (CVD) on silicon substrates. However, TEM requires very thin samples, which are electron transparent. Therefore, for TEM analysis, CVD grown nanotubes are typically deposited on commercial TEM grids by post-processing. However, this procedure can damage the nanotubes, and it does not work reliably if the nanotube density is too low. The ability to do TEM directly on as-grown nanotubes on the silicon substrate would solve these problems. For this purpose, we have fabricated micromachined silicon TEM grids with narrow open slits on them. Since the nanotubes grown on these substrates are suspended freely over the open slits, the micromachined substrates form a natural TEM grid for direct imaging of CVD grown nanotubes. Furthermore, the background noise is significantly reduced during micro-Raman spectroscopy, resulting in a better signal-to-noise ratio. As a result, these micromachined Si substrates provide a low cost, mass producible, efficient, and reliable platform for direct TEM, SEM, AFM, and Raman characterization of as-grown nanotubes. These grids can be used for characterizing a wide range of other nanomaterials, including peapods, nanowires, and nanofibres.
机译：透射电子显微镜（TEM）是碳纳米管结构表征中的关键技术。对于器件应用，通常通过化学气相沉积（CVD）在硅基板上生长碳纳米管。但是，TEM需要非常薄的样品，这些样品是电子透明的。因此，对于TEM分析，通常通过后处理将CVD生长的纳米管沉积在商业TEM网格上。但是，此过程可能会损坏纳米管，并且如果纳米管密度太低，它将无法可靠地工作。直接在硅基板上生长的纳米管上进行TEM的能力将解决这些问题。为此，我们制造了在其上具有狭窄开口缝隙的微加工硅TEM网格。由于在这些基板上生长的纳米管自由地悬在开口缝隙上，因此微机械加工的基板形成了天然TEM网格，用于CVD生长的纳米管的直接成像。此外，在微拉曼光谱分析过程中，背景噪声显着降低，从而产生了更好的信噪比。结果，这些微机械加工的Si基板为生长的纳米管的直接TEM，SEM，AFM和拉曼表征提供了低成本，可大量生产，高效且可靠的平台。这些栅格可用于表征各种其他纳米材料，包括豆荚，纳米线和纳米纤维。

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