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THE THRESHOLD ANOMALY IN THE O-16+NI-58,NI-60,NI-62,NI-64 SYSTEMS

机译:Te TH Resho LD异常LY Inteo 16+ Ni-58,Ni-60,Ni-62,Ni-64 SYS MS

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摘要

Accurate angular distributions of O-16 ions scattered by Ni-58,Ni-60,Ni-62,Ni-64 have been measured at five energies between 60 and 120 MeV. An optical model analysis of these, together with existing data, indicates that, whereas there is a significant increase with A in the surface absorption, there is little, if any, isotopic dependence in the energy variation of the optical potentials, V(E) and W(E), near threshold (the threshold anomaly). Clear evidence is found for a hitherto unreported peak in W(E) just above threshold. CRC calculations, including inelastic excitation and transfer, reproduce the data but show no clear connection between the peak and a particular reaction channel. [References: 36]
机译:在60和120 MeV之间的五种能量下,已经测量了由Ni-58,Ni-60,Ni-62,Ni-64散射的O-16离子的准确角分布。对它们的光学模型分析以及现有数据表明,尽管表面吸收随A的增加而显着增加,但是光势的能量变化V(E)几乎没有同位素依赖性(如果有的话) W(E),接近阈值(阈值异常)。找到了明确的证据,表明W(E)的一个迄今未报告的峰刚刚超过阈值。 CRC计算(包括非弹性激发和传递)可重现数据,但显示峰与特定反应通道之间没有明确的联系。 [参考:36]

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