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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Direct Laser Writing on Electrolessly Deposited Thin Metal Films for Applications in Micro-and Nanofluidics
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Direct Laser Writing on Electrolessly Deposited Thin Metal Films for Applications in Micro-and Nanofluidics

机译：在化学沉积的金属薄膜上直接进行激光刻写，用于微流控和纳米流控

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摘要

This paper presents a method that uses a tightly focused laser beam to write features on thin metal films with a resolution of several hundred nanometers to a few micrometers.Owing to the ease of fabricating electrolessly and electrolytically deposited Ni layers,we also evaluated with scanning electron microscopy the suitability of such thin Ni films as a substrate for laser writing and subsequently as an etch resist in HF etching and as a photomask in contact photolithography.Using atomic force microscopy,we characterized the feature sizes that can be obtained from three commonly used lasers: the 488 nm of a continuous wave(CW)Ar~+ laser,the 1064 nm of a CW Nd:YAG laser,and the 337 nm of a pulsed(3 ns pulse width)N2 laser.The smallest feature sizes that we can generate routinely are approximately 0.5 mum for the Ar~+ laser,1.3 mum for the YAG laser,and 2.3 mum for the N2 laser.Using the laser-patterned Ni film as an etch mask,we have produced HF-etched channels(1.5 mum in width)in glass.In addition to Ni films,we demonstrate the flexibility of this strategy to create photomasks by writing directly on sputtered gold films and on commercially available chrome blanks.
机译：本文提出了一种方法，该方法使用紧密聚焦的激光束在分辨率为几百纳米到几微米的金属薄膜上书写特征。由于易于制造化学沉积和电解沉积的镍层，我们还对扫描电子进行了评估显微镜检查这种镍薄膜的适用性，作为激光写入的基材，然后作为HF蚀刻的抗蚀剂，以及作为接触光刻的光掩模。使用原子力显微镜，我们表征了可以从三种常用激光器获得的特征尺寸：连续波（CW）Ar〜+激光的488 nm，连续Cd Nd：YAG激光的1064 nm和脉冲（3 ns脉冲宽度）N2脉冲的337 nm。通常，对于Ar〜+激光器，大约产生0.5微米;对于YAG激光器，产生大约1.3微米;对于N2激光器，产生大约2.3微米。使用激光图案化的Ni膜作为蚀刻掩模，我们产生了HF蚀刻通道（1.5微米）。宽）in gla除镍膜外，我们还演示了通过直接在溅射的金膜和市售铬坯料上书写来创建光掩模的这种策略的灵活性。

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