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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Reversible protection and reactive patterning of amine- and hydroxyl-terminated self-assembled monolayers on gold surfaces for the fabrication of biopolymer arrays
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Reversible protection and reactive patterning of amine- and hydroxyl-terminated self-assembled monolayers on gold surfaces for the fabrication of biopolymer arrays

机译：金表面胺和羟基末端自组装单分子膜的可逆保护和反应性构图，用于制造生物聚合物阵列

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摘要

The reversible protection of amine- and hydroxyl-terminated alkanethiol self-assembled monolayers (SAMs) on gold surfaces using the base-labile protecting group 9-fluorenylmethoxycarbonyl (Fmoc) and the acid-labile protecting group dimethoxytrityl (DMT) is described. When used in combination with UV photopatterning or mu-contact printing techniques, his reversible SAM protection chemistry can be used to control the reactivity and wettability of different portions of the surface. Such spatial control is utilized in the fabrication of DNA arrays. Specifically, gold surfaces modified with the amine-terminated alkanethiol 11-mercaptoundecylamine (MUAM) are reacted with an N-hydroxysuccinimide (NHS) ester derivative of Fmoc, forming a covalent urethane (carbamate) linkage and converting the initially hydrophilic MUAM surface to a hydrophobic, Fmoc-terminated surface. Upon exposure of the Fmoc-modified surface to a solution of a secondary amine, the Fmoc is cleaved, regenerating the original hydrophilic MUAM surface. Fmoc is also utilized as a hydroxyl protecting group, as demonstrated by the reaction of Fmoc-Cl with a monolayer of 11-mercaptoundecanol (MUD). The hydrophobic protecting group DMT is reacted with the w-hydroxyl groups of both MUD and poly(ethylene glycol)-terminated alkanethiol (PEG-SH) SAMs to form an acid labile ether bond; removal of the DMT group is accomplished by soaking the surface in 3% trifluoracetic acid. A combination of polarization-modulation Fourier transform infrared reflection absorption spectroscopy (PM-FTIRRAS), surface plasmon resonance (SPR), and contact angle measurements is used to characterize the attachment and subsequent removal of the protecting groups. To demonstrate one application of this SAM protection chemistry and reactive patterning, a DNA array is fabricated and used in an SPR imaging measurement of the adsorption of the mismatch binding protein MutS. [References: 37]
机译：描述了使用碱不稳定的保护基9-芴基甲氧基羰基（Fmoc）和酸不稳定的保护基二甲氧基三苯甲基（DMT）在金表面上可逆保护胺和羟基封端的链烷硫醇自组装单分子膜（SAMs）。当与UV光刻或mu-contact印刷技术结合使用时，他的可逆SAM保护化学剂可用于控制表面不同部分的反应性和润湿性。在DNA阵列的制造中利用了这种空间控制。具体而言，将用胺末端的链烷硫醇11-巯基十一胺（MUAM）修饰的金表面与Fmoc的N-羟基琥珀酰亚胺（NHS）酯衍生物反应，形成共价氨基甲酸酯（氨基甲酸酯）键并将最初的亲水MUAM表面转化为疏水，Fmoc端接的表面。将Fmoc修饰的表面暴露于仲胺溶液后，Fmoc裂解，从而再生出原始的亲水性MUAM表面。 Fmoc还用作羟基保护基，如Fmoc-Cl与11-巯基十一烷醇（MUD）单层的反应所证明。疏水保护基DMT与MUD和聚（乙二醇）封端的链烷硫醇（PEG-SH）SAMs的w-羟基反应形成酸不稳定的醚键;除去DMT基团是通过将表面浸入3％三氟乙酸中来完成的。偏振调制傅里叶变换红外反射吸收光谱（PM-FTIRRAS），表面等离振子共振（SPR）和接触角测量的组合用于表征保护基团的附着和随后的去除。为了证明这种SAM保护化学和反应模式的一种应用，制造了一个DNA阵列并将其用于SPR成像测量错配结合蛋白MutS的吸附。 [参考：37]

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