...
机译:
机译:Atomic structure and defect densities in low dielectric constant carbon doped hydrogenated silicon oxide films, deposited by plasma-enhanced chemical vapor deposition
机译:Effect of oxygen plasma treatment on low dielectric constant carbon-doped silicon oxide thin films
机译:Origin of low dielectric constant of carbon-incorporated silicon oxide film deposited by plasma enhanced chemical vapor deposition
机译:p-Type Transparent Amorphous Oxide Thin-Film Transistors Using Low-Temperature Solution-Processed Nickel Oxide
机译:Enhanced Dielectric Constant for Efficient Electromagnetic shielding Based on Carbon-Nanotube-added styrene acrylic Emulsion Based Composite