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Cu/MoS2/ITO based hybrid structure for catalysis of hydrazine oxidation

机译:基于Cu / MoS2 / ITO的杂化结构催化肼氧化

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We have successfully demonstrated large-area and continuous MoS2 films grown on indium tin oxide (ITO) substrates by RF sputtering followed by a post-annealing process. Thin Cu layers were prepared on MoS2/ITO films by thermal evaporation to enhance electron-transfer rates as well as the catalytic activity of hydrazine oxidation. High electrocatalytic activity towards hydrazine oxidation was observed in a Cu/MoS2/ITO hybrid structure. A large residual current was also observed in the Cu/MoS2/ITO hybrid due to the combination of MoS2 and Cu film. The electrocatalytic activity was enhanced with the increase of the MoS2 film thickness. The observed results showed that the Cu/MoS2/ITO catalyst is indeed a valuable material for future applications in hydrazine fuel cells.
机译:我们已经成功地演示了通过射频溅射及其后退火工艺在铟锡氧化物(ITO)衬底上生长的大面积连续MoS2膜。通过热蒸发在MoS2 / ITO膜上制备薄Cu层,以提高电子传输速率以及肼氧化的催化活性。在Cu / MoS2 / ITO杂化结构中观察到对肼氧化的高电催化活性。由于MoS2和Cu膜的结合,在Cu / MoS2 / ITO杂化物中还观察到较大的残留电流。随着MoS2膜厚度的增加,电催化活性增强。观察到的结果表明,Cu / MoS2 / ITO催化剂确实是肼燃料电池未来应用的有价值的材料。

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