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Significant roughness enhancement of fluorine-doped tin oxide films with low resistivity and high transparency by using HNO3 addition

机译:通过添加HNO3显着提高低电阻率和高透明度的氟掺杂氧化锡薄膜的粗糙度

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Current development of fluorine-doped tin oxide (FTO) films for application in solar cells is limited by tradeoffs among surface roughness related light trapping, optical transparency and electrical conductivity. Proposed methods for improving the surface roughness are usually dependent upon thickness increment or sacrificing the conductivity. In this study, we report a simple method for preparing FTO films with a flower-like grain morphology and thus a higher than ever mean roughness of 51.4-73.3 nm or mean-root-square roughness of 70.5-91 nm, by inclusion of HNO3 additive into the deposition system. The very rough films are 200-300 nm thick and also have maintained a high transparency of 80-85% in the visible region and a low sheet resistance of 14 Omega square(-1) and resistivity of 4.2 x 10(-4) Omega cm, perhaps resulting from the effects of HNO3 on heterogeneous nucleation and development of the (200) preferred orientation. The high roughness, combined with high transparency and low resistivity, would be beneficial to improving the light trapping of FTO films and thus the efficiency of solar cells.
机译:用于太阳能电池的氟掺杂氧化锡(FTO)膜的当前开发受到与表面粗糙度有关的光捕获,光学透明性和导电性之间的权衡的限制。提出的改善表面粗糙度的方法通常取决于厚度的增加或牺牲电导率。在这项研究中,我们报告了一种简单的方法来制备FTO膜,该膜具有花朵状的晶粒形态,因此通过包含HNO3,其平均粗糙度比以往任何时候都要高,为51.4-73.3 nm或均方根粗糙度为70.5-91 nm。添加剂进入沉积系统。非常粗糙的薄膜厚度为200-300 nm,在可见光区域也保持了80-85%的高透明度,以及14 Omega square(-1)的低薄层电阻和4.2 x 10(-4)Omega的电阻率,这可能是由于HNO3对(200)首选取向的异质成核和发展的影响。高粗糙度与高透明度和低电阻率相结合,将有利于改善FTO薄膜的光俘获,从而改善太阳能电池的效率。

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