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首页> 外文期刊>RSC Advances >Characterization and corrosion behavior of Co and Co-P coatings electrodeposited from chloride bath
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Characterization and corrosion behavior of Co and Co-P coatings electrodeposited from chloride bath

机译：氯化物浴中电沉积的Co和Co-P涂层的特性和腐蚀行为

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摘要

Co-P coatings with low and high phosphorous contents are electrodeposited using direct current (DC) and pulse current (PC) methods from cobalt chloride baths. The low phosphorous content coatings obtained from DC and PC methods are crystalline with predominantly fcc structure, while the high P content coatings are amorphous. Electrochemical corrosion studies reveal an increase in corrosion resistance with increasing phosphorous content in both DC and PC plated coatings. The PC coatings show a higher polarization resistance (R-p) and a lower corrosion current density (i(corr)), indicating better corrosion resistance. Compositional analysis shows a slight or no increase in P content after corrosion in PC coatings with a high P content, indicating better corrosion resistance. Comparisons of the surface morphologies before and after corrosion illustrate that the PC plated coatings are less affected than their DC counterparts. X-ray photoelectron spectroscopy (XPS) reveals a larger amount of oxidized cobalt in the PC electrodeposited coatings, whereas mainly metallic Co species are found in the DC plated coatings. This study demonstrates that the overall corrosion resistance for the PC deposited coatings is better than that of the DC deposited coatings because of the high P content, amorphous structure, smooth morphology, and higher metal oxide content in the deposits.
机译：在氯化钴浴中使用直流（DC）和脉冲电流（PC）方法对低磷含量和高磷含量的Co-P涂层进行电沉积。通过DC和PC方法获得的低磷含量涂层是具有fcc结构的晶体，而高P含量涂层是无定形的。电化学腐蚀研究表明，随着DC和PC镀层中磷含量的增加，耐腐蚀性也随之提高。 PC涂层显示出较高的耐极化性（R-p）和较低的腐蚀电流密度（i（corr）），表明具有较好的耐腐蚀性。成分分析表明，高P含量的PC涂层腐蚀后P含量略有增加或没有增加，表明具有更好的耐腐蚀性。腐蚀前后的表面形貌比较表明，PC镀层的影响要小于DC镀层。 X射线光电子能谱（XPS）揭示了PC电沉积涂层中有大量氧化钴，而在DC电镀涂层中主要发现了金属Co物种。这项研究表明，由于高P含量，无定形结构，光滑的形貌和较高的金属氧化物含量，PC沉积涂层的总体耐腐蚀性优于DC沉积涂层。

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