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首页> 外文期刊>Optics Letters >Ultraviolet wave plates based on monolithic integration of two fully filled and planarized nanograting layers
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Ultraviolet wave plates based on monolithic integration of two fully filled and planarized nanograting layers

机译：基于两个完全填充的平面化纳米光栅层的整体集成的紫外线波片

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摘要

We successfully fabricated a high-performance half-wave plate for the 405 nm wavelength based on monolithic integration of two nanograting layers. Each of the nanograting layers functions as a quarter-wave plate. Both of the nanograting layers were fully filled and planarized to achieve the monolithic integration. UV-nanoimprint lithography, along with thin-film deposition, high-aspect-ratio reactive ion etching, and trench-filling technologies, was used in fabrication and integration of the individual nanograting layers. High-aspect-ratio nanogratings with sub-50 nm linewidths and 100 nm spacing were fabricated to achieve good optical performance at the near-UV wavelength. The ability to integrate multiple nanostructure-based optical layers opens a path for integrated multifunction devices, as well as a new strategy for driving both miniaturization and cost.
机译：基于两个纳米光栅层的单片集成，我们成功地制造了405 nm波长的高性能半波片。每个纳米光栅层用作四分之一波片。将两个纳米光栅层完全填充并平坦化以实现单片集成。 UV-纳米压印光刻技术以及薄膜沉积，高纵横比反应离子刻蚀和沟槽填充技术被用于单个纳米光栅层的制造和集成。制作了具有50纳米线宽和100纳米间距的高纵横比纳米光栅，以在近紫外波长下实现良好的光学性能。集成多个基于纳米结构的光学层的能力为集成多功能设备开辟了道路，同时也为推动小型化和低成本发展提供了新的策略。

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