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Study of the mechanical interaction between an electromagnetic field and a nanoscopic thin film near electronic resonance

机译：电磁场与纳米薄膜在电子共振附近的机械相互作用研究

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摘要

The mechanical interaction between an electromagnetic field and a nanoscopic thin film near electronic resonance is theoretically studied by calculation of Maxwell's stress tensor. As a result of numerical demonstrations for both propagating and evanescent incident waves, the following effects that are specific to this condition have been clarified: (1) The force exerted on a nanoscopic thin film is greatly enhanced near the resonance frequency to the same order of magnitude as for a film with macroscopic thickness. (2) The peak position of the gradient force in its spectrum is highly sensitive to the change in nanoscopic thickness that is due to the polaritonic effect. (3) In a total-reflection region a large enhancement of the repulsive force between the two thin films occurs when the films act as an optical cavity.
机译：理论上通过计算麦克斯韦应力张量来研究电磁场和接近电子共振的纳米薄膜之间的机械相互作用。作为传播和e逝入射波的数值演示的结果，已经阐明了针对该条件的以下效果：（1）在共振频率附近，施加在纳米薄膜上的力大大提高到相同的数量级。对于具有宏观厚度的膜而言，其幅值最大。 （2）梯度力在其光谱中的峰值位置对由于极化效应产生的纳米厚度的变化高度敏感。 （3）在全反射区域中，当两个薄膜充当光学腔时，两个薄膜之间的排斥力大大增强。

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