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Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

机译:通过图案化的烷氧基钛溶液光沉积直接制造物理浮雕结构

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摘要

Ultraviolet (lambda velence 248 nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 (mu)m wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm~(2), respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm~(2) was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.
机译:发现光敏的Ti醇盐溶液的紫外线(λvelence 248 nm)激发在照明过程中在与溶液接触的基材上产生基于金属氧化物的不溶膜。在曝光期间使用狭缝形的铝阴影掩模展示了图案化的100微米宽的材料线的沉积。触针轮廓仪证实,光沉积膜的平均厚度随累积的UV能量密度单调变化,对于12和192 J / cm〜(2)的能量密度分别显示10至310 nm的厚度。此外,发现在注量大于12J / cm 2(2)时膜表面的表面轮廓再现了从所使用的狭缝掩模预期的近场菲涅耳衍射图案。

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