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Gaussian-beam-induced photorefractive birefringence and its application to radio-frequency signal excision

机译:高斯光束诱导的光折变双折射及其在射频信号切除中的应用

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摘要

For Gaussian-beam-induced optical limiting based on photoconductive field shielding of electro-optic (EO) birefringence, power-limiting notch widths may be accurately determined by considering the power-limiting threshold for the photorefractive crystal where excess charge accumulates. With sufficient optical intensity the space-charge field completely screens the externally applied electric field, and only a small diffusion field remains. The upper limit of light intensity attenuation is the extinction ratio for the combination of polarizers and EO crystal.
机译:对于基于电光(EO)双折射的光导场屏蔽的高斯光束诱导的光学限制,可以通过考虑累积过多电荷的光折变晶体的功率限制阈值来准确确定功率限制槽口宽度。在足够的光强度下,空间电荷场完全屏蔽了外部施加的电场,仅剩下很小的扩散场。光强度衰减的上限是偏振片和EO晶体的组合的消光比。

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