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首页> 外文期刊>CERAMICS INTERNATIONAL >Effect of TiO_2 nanostructures on specific capacitance of Al_2O_3-TiO_2 composite film on etched aluminum foil formed by the sol-gel and anodizing
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Effect of TiO_2 nanostructures on specific capacitance of Al_2O_3-TiO_2 composite film on etched aluminum foil formed by the sol-gel and anodizing

机译:TiO_2纳米结构对溶胶-凝胶法阳极氧化铝箔上Al_2O_3-TiO_2复合膜比电容的影响

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摘要

Nano-thin TiO_2 film on etched aluminum foil was prepared by the Sol-gel dip-coating method and annealing post-treatment at different temperatures;;then, Al_2O_3-TiO_2 composite oxide film on etched aluminum foil was fabricated by anodization in 13 wt% ammonium adipate solution. Nanostructures of TiO_2 film were characterized by means of X-ray Diffraction (XRD), Raman Spectroscopy (RS), and Atomic Force Microscope (AFM). TiO_2 nanostructured films are composed of anatase nanopartilces in size of 5-12 nm as annealed at 400 °C and 500 °C, and anatase-rutile complex nanopartilces in 5-15 nm at 600 °G. Compared with pure anodic aluminum oxide film, TiO_2 nanostructures effectively improved specific capacitance of the Al_2O_3-TiO_2 composite oxide film on etched aluminum foil, with an increment ratio of about 8.6%, 24.6%, and 33.3%, caused by anatase and ratile content increasing with annealing temperature from 400 °C, 500 °C to 600 °C, respectively. The specific capacitance of dip-coated etched aluminum foil annealed at 500 °C reached to a maximum after two dip-coating times with 28.3% enhancement.
机译:采用溶胶-凝胶浸涂法,在不同温度下进行退火后处理,制备了铝箔刻蚀后的纳米TiO_2薄膜;然后以13wt%的阳极氧化工艺制备了铝箔刻蚀后的Al_2O_3-TiO_2复合氧化物膜。己二酸铵溶液。利用X射线衍射(XRD),拉曼光谱(RS)和原子力显微镜(AFM)对TiO_2薄膜的纳米结构进行了表征。 TiO_2纳米结构薄膜由在400°C和500°C下退火的5-12 nm的锐钛矿纳米颗粒和在600°G的5-15 nm的锐钛矿-金红石型复合纳米颗粒组成。与纯阳极氧化铝膜相比,TiO_2纳米结构有效改善了铝箔刻蚀后的铝箔上的Al_2O_3-TiO_2复合氧化物膜的比电容,由于锐钛矿和微晶石含量的增加,其增量比分别约为8.6%,24.6%和33.3%。退火温度分别为400°C,500°C至600°C。经过两次浸涂时间后,在500°C退火的浸涂蚀刻铝箔的比电容达到最大值,提高了28.3%。

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