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首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Novel Gray-toneless Technology for Mask Reduction in High Aperture Rate FFS Mode
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Novel Gray-toneless Technology for Mask Reduction in High Aperture Rate FFS Mode

机译:高开口率FFS模式下用于减少掩模的新型无灰调技术

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摘要

In this paper, we have successfully developed novel gray-toneless technology for mask reduction in high aperture rate FFS mode. The key processes are the gray-toneless technology and new PIC (pixel ITO plus channel) processes. These new technologies are able to protect channel area from pixel ITO processes and decrease defect rate of data line open due to having double layer structure. Also Panel quality was improved by reducing capacitance change between Pixel and Data line through PIC processes.
机译:在本文中,我们成功开发了新颖的无灰调技术,可在高开口率FFS模式下减少掩模。关键过程是无灰度技术和新的PIC(像素ITO加通道)过程。这些新技术能够保护沟道区域免受像素ITO工艺的影响,并由于具有双层结构而降低了数据线开路的缺陷率。此外,通过降低PIC工艺在像素和数据线之间的电容变化,还改善了面板质量。

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