首页> 外文期刊>Separation and Purification Technology >In-line coagulation/ultrafiltration for silica removal from brackish water as RO membrane pretreatment
【24h】

In-line coagulation/ultrafiltration for silica removal from brackish water as RO membrane pretreatment

机译:在线凝结/超滤,用于反渗透膜预处理,从微苦水中去除二氧化硅

获取原文
获取原文并翻译 | 示例
           

摘要

Brackish water with a silica concentration of 30 mg/L as SiO2 was studied for silica removal using in-line coagulation/ultrafiltration (UF) processes to prevent scaling problems in a reverse osmosis (RO) membrane treatment plant. Other than pH and coagulant dosage, mixing intensity and velocity gradient are also a critical factor with respect to silica removal. Different velocity gradient (G), pH and alum dose were experimented and contour plots were used to determine the optimum silica removal. The optimum silica removal of 65% was achieved with G = 2000 s~(-1), pH = 7.1 and alum dosage=30 mg/L as Al2O3, corresponding to a maximum of 87% recovery for the RO membrane plant. Silica was removed by co-precipitation of aluminum hydroxide, supported by the results of turbidity and silica measurement. Although the optimum G value to reduce the membrane fouling potential was 1000 s~(-1), G value of 2000 s~(-1) can serve the purposes of silica removal with lower fouling potential for this UF membrane. Streaming potential by electrokinetic analyzer was used to analyze the UF membrane before and after filtration, and a slight reduction of negative charge was observed at medium pH, resulting from the adsorption of positively charged coagulated particles on the negatively charged UF membrane surface, energy dispersive X-ray spectroscopy also showed a slight aluminum and silica signal on the used UF membrane surface.
机译:研究人员使用在线凝聚/超滤(UF)工艺去除了二氧化硅浓度为30 mg / L的微咸水(SiO2),以防止反渗透(RO)膜处理厂中的结垢问题。除pH和凝结剂用量外,混合强度和速度梯度也是去除二氧化硅的关键因素。实验了不同的速度梯度(G),pH和明矾剂量,并使用等高线图确定了最佳的二氧化硅去除率。在G = 2000 s〜(-1),pH = 7.1和明矾剂量= 30 mg / L的Al2O3的条件下,实现了最佳的二氧化硅去除率达65%,对应于RO膜装置的最高回收率达到87%。通过浊度和二氧化硅测量结果的支持,通过氢氧化铝的共沉淀去除二氧化硅。尽管降低膜结垢潜力的最佳G值为1000 s〜(-1),但2000 s〜(-1)的G值可用于以较低的结垢潜力去除这种UF膜的二氧化硅。在过滤前后,使用电动分析仪的流动电势来分析超滤膜,并且在中等pH下观察到负电荷略有减少,这是由于带正电的凝结颗粒吸附在带负电的UF膜表面上,能量分散X射线光谱法还显示用过的超滤膜表面有少量铝和二氧化硅信号。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号