• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Solid state sciences >Fabrication of surface-textured ZnO:Al/ITO bilayers with enhanced electrical and light-scattering properties
【24h】

Fabrication of surface-textured ZnO:Al/ITO bilayers with enhanced electrical and light-scattering properties

机译：具有电和光散射特性的表面纹理化ZnO：Al / ITO双层薄膜的制备

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Highly textured ZnO:Al/ITO bilayers with excellent electrical and light-scattering properties were prepared on glass substrates using RF magnetron sputtering followed by a wet-etching process. In the bilayer structure, the sputtered ZnO:Al films were deposited on highly conductive ITO-coated glass substrates, and the ZnO:Al surfaces were subsequently chemically etched with a 1% HCl solution to modify the surface morphology. After wet-etching for the as-deposited ZnO:Al films without ITO films, the diffuse transmittance of the ZnO:Al films without ITO films deposited up to 100 ℃ was enhanced by the rough surfaces, accompanied by an abrupt increase in the sheet resistance to approximately 300 Ω/ square due to the reduction in film thickness. The [001] orientation of the ZnO:Al films deposited on the ITO films with various crystalline orientations decreased significantly compared with the strong [001] preferred orientation of the ZnO:Al films deposited without the ITO films. For the textured ZnO:Al/ITO bilayers, a low sheet resistance below 10 Ω/square was obtained, and the light-scattering properties of these bilayers of 400—1100 nm were superior to those of the Asahi U glass that has been widely used as a transparent conducting electrode in thin-film solar cells. The material properties of the as-deposited and textured ZnO:Al/ITO bilayers with and without ITO films were systematically investigated.
机译：使用RF磁控溅射，然后进行湿法蚀刻工艺，在玻璃基板上制备具有优异电和光散射特性的高织构化ZnO：Al / ITO双层薄膜。在双层结构中，溅射的ZnO：Al膜沉积在高导电率的ITO涂层玻璃基板上，随后用1％HCl溶液对ZnO：Al表面进行化学蚀刻，以改变表面形态。湿法刻蚀无ITO膜的ZnO：Al膜后，粗糙表面提高了无ITO膜沉积的ZnO：Al膜在100℃时的漫透射率，并伴随着薄层电阻的突然增加。由于薄膜厚度的减小，最大约为300Ω/平方。与不沉积ITO膜的ZnO：Al膜的强[001]优选方向相比，沉积在具有各种晶体取向的ITO膜上的ZnO：Al膜的[001]取向显着降低。对于带纹理的ZnO：Al / ITO双层，可以获得低于10Ω/平方的低薄层电阻，并且这些400-1100 nm双层的光散射特性优于已被广泛使用的Asahi U玻璃作为薄膜太阳能电池中的透明导电电极。系统地研究了具有和不具有ITO膜的沉积和织构化ZnO：Al / ITO双层的材料性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号