• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Chemical vapor deposition: CVD >Deposition of palladium from a cyleopentadienyl-allyl-palladium precursor on Si-based substrates with various pretreatments: The role of surface Si-OH and Si-H species studied by X-ray photoelectron spectroscopy
【24h】

Deposition of palladium from a cyleopentadienyl-allyl-palladium precursor on Si-based substrates with various pretreatments: The role of surface Si-OH and Si-H species studied by X-ray photoelectron spectroscopy

机译：用各种预处理从硅基戊二烯基-烯丙基-钯前体上的钯沉积在Si基衬底上：通过X射线光电子能谱研究表面Si-OH和Si-H的作用

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The decomposition reactions of a metal-organic, precursor for the CVD of Pd, (Cp)Pd(allyl), on Si substrates with various terminated surfaces have been studied using X-ray photoelectron spectroscopy (XPS). The XPS data show that mixed hydrogen/hydroxyl-terminated Si surfaces exhibit the highest activity ascribed to acidic Si-OH groups for precursor decomposition, followed by the as-received Si surface. Clean, well-defined SiO2 surfaces prepared in ultrahigh vacuum (UHV) exhibit the lowest activity for the Pd precursor decomposition, whereas the hydrogen-terminated Si surface was rather active. Scanning electron microscopy (SEM) images show that Pd clusters were formed on the mixed hydrogen/hydroxyl-terminated Si surface with a coverage of about 10%. The average size of the Pd clusters is about 30 run. Based on the XPS experimental data, a hydrogen-assisted decomposition mechanism of the Pd precursor is proposed.
机译：使用X射线光电子能谱（XPS）研究了用于Pd（Cp）Pd（烯丙基）的CVD的金属有机前体在具有各种终止表面的Si衬底上的分解反应。 XPS数据表明，混合的氢/羟基封端的Si表面表现出最高的活性，这归因于酸性Si-OH基团的前体分解，然后是原样的Si表面。在超高真空（UHV）中制备的干净，轮廓分明的SiO2表面显示出最低的Pd前体分解活性，而氢封端的Si表面则相当活泼。扫描电子显微镜（SEM）图像显示，Pd团簇形成在氢/羟基封端的混合Si表面上，覆盖率约为10％。 Pd簇的平均大小约为30游程。基于XPS实验数据，提出了Pd前驱体的氢辅助分解机理。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号