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首页> 外文期刊>PASJ: Publications of the Astronomical Society of Japan >Comparative Study of Manufacturing Techniques for Coronagraphic Binary Pupil Masks: Masks on Substrates and Free-Standing Masks
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Comparative Study of Manufacturing Techniques for Coronagraphic Binary Pupil Masks: Masks on Substrates and Free-Standing Masks

机译：冠状二元瞳孔掩模制造技术的比较研究：基材上的掩模和自由站立的掩模

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摘要

We present a comparative study of the manufacture of binary pupil masks for coronagraphic observations of exoplanets. A checkerboard mask design, a type of binary pupil mask design, was adopted, and identical patterns of the same size were used for all masks in Order that we could compare the differences resulting from the different manufacturing methods. The masks on substrates had aluminum checkerboard patterns with thicknesses of 0.1/0.2/0.4/0.8/1.6 μm, constructed on substrates of BK7 glass, silicon, and germanium using photolithography and chemical processes. Free-standing masks made of copper and nickel with thicknesses of 2/5/10/20 μm were also realized using photolithography and chemical processes, which included careful release from the substrate used as an intermediate step in, the manufacture. Coronagraphic experiments using a visible laser were carried out for all masks on BK7 glass substrate and the free-standing masks. The average contrasts were 8.4 × 10~(-8), 1.2 × 10~(-7), and 1.2 × 10~(-7) for the masks on BK7 substrates, the free-standing copper masks, and the free-standing nickel masks, respectively. No significant correlation was concluded between the contrast and the mask properties. The high-contrast masks have the potential to cover the needs of coronagraphs for both ground-based and space- borne telescopes over a wide wavelength range. Especially, their application to the infrared space telescope, SPICA, is appropriate.
机译：我们提出了对用于系外行星日冕观测的二元瞳孔掩模制造的比较研究。采用了棋盘格掩模设计（一种二元瞳孔掩模设计），并且所有掩模都使用了相同大小的相同图案，以便我们可以比较不同制造方法产生的差异。基板上的掩模具有铝棋盘图案，厚度为0.1 / 0.2 / 0.4 / 0.8 / 1.6μm，是通过光刻和化学工艺在BK7玻璃，硅和锗的基板上构造的。还使用光刻和化学工艺实现了厚度为2/5/10/20μm的由铜和镍制成的自立式掩模，包括从用作制造中间步骤的基板上小心释放。对BK7玻璃基板上的所有掩膜和独立掩膜进行了使用可见激光的电晕实验。 BK7基板上的掩膜，独立式铜掩膜和独立式掩膜的平均对比度分别为8.4×10〜（-8），1.2×10〜（-7）和1.2×10〜（-7）镍面罩。在对比度和掩模特性之间没有得出明显的相关性。高对比度的掩膜有可能满足宽波长范围内地面望远镜和星载望远镜的日冕仪需求。尤其适合将其应用于红外太空望远镜SPICA。

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