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Characterization of Al-implanted 4H SiC high voltage diodes

机译:注入铝的4H SiC高压二极管的特性

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摘要

The properties of 4H-SiC chemical vapor deposition epitaxial layers were studied by different methods. The effects of structural defects in 4H-SiC epitaxial layers on electrical and luminescence properties of Al high dose ion implanted p(+)-n junctions were studied. It has been shown that the structural imperfections of low-doped layers affect some electrical characteristics of the ion doped p(+)-n junctions created in these epitaxial layers. [References: 5]
机译:采用不同的方法研究了4H-SiC化学气相沉积外延层的性能。研究了4H-SiC外延层中的结构缺陷对Al高剂量离子注入p(+)-n结的电学和发光性能的影响。已经表明,低掺杂层的结构缺陷会影响在这些外延层中形成的离子掺杂p(+)-n结的某些电学特性。 [参考:5]

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