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首页> 外文期刊>Physica Scripta: An International Journal for Experimental and Theoretical Physics >Analytical model of breakdown voltage and on-resistance for PN diodes with linearly doped epi layer
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Analytical model of breakdown voltage and on-resistance for PN diodes with linearly doped epi layer

机译:线性掺杂外延层的PN二极管的击穿电压和导通电阻的解析模型

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摘要

Closed-form expressions for breakdown voltage and on-resistance of linearly doped pn diodes are derived in terms of the concentration ratio of the final to the initial value of a linearly doped epi layer. Analytical results for the maximum depletion width, critical electric field, and breakdown voltage are verified by the device simulator MEDICI. The minimum on-resistance is found to occur when the concentration ratio approaches 2.2, yielding a reduction of 8.3% in the on-resistance compared to that for the uniformly doped pn diode. [References: 4]
机译:根据线性掺杂外延层的最终值与初始值的浓度比,得出线性掺杂pn二极管的击穿电压和导通电阻的闭合形式。通过器件仿真器MEDICI验证了最大耗尽宽度,临界电场和击穿电压的分析结果。发现当浓度比接近2.2时会出现最小的导通电阻,与均匀掺杂的pn二极管相比,导通电阻降低8.3%。 [参考:4]

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