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首页> 外文期刊>Physica Scripta: An International Journal for Experimental and Theoretical Physics >Study on energetic ions behavior in plasma facing materials at lower temperature
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Study on energetic ions behavior in plasma facing materials at lower temperature

机译：低温下面向等离子体的材料中高能离子行为的研究

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An apparatus equipped with X-ray Photoelectron Spectroscopy (XPS) and Thermal Desorption Spectroscopy (TDS) was constructed to study interactions of energetic hydrogen isotopes with plasma facing materials. It is a remarkable feature of the apparatus that energetic ion implantation is carried out at around 150 K to study reactions of energetic ions with matrix by suppressing the reactions of thermalized ions. Using this apparatus, TDS experiments for pyrolytic graphite implanted with energetic D-2(+) ions at 173 and 373 K were carried out. The experimental results suggest that the deuterium implanted was released through a four-step release processes, involving three D-2 and one CDx (x = 2.3 and 4) desorption processes. Two deuterium and CDx desorption processes were observed in the temperature range from 700 to 1220 K. In addition, a new deuterium desorption process was observed for the deuterium-implanted sample at 173 K. This has never been observed for deuterium-implanted graphite implanted at temperatures higher than room temperature (R.T.). [References: 9]
机译：构造了配备有X射线光电子能谱（XPS）和热解吸能谱（TDS）的设备，以研究高能氢同位素与面向等离子体的材料之间的相互作用。该设备的显着特征是，在150 K左右进行高能离子注入，以通过抑制热离子的反应来研究高能离子与基质的反应。使用此设备，进行了在173和373 K下注入高能D-2（+）离子的热解石墨的TDS实验。实验结果表明，植入的氘通过四步释放过程释放，涉及三个D-2和一个CDx（x = 2.3和4）解吸过程。在700至1220 K的温度范围内观察到了两种氘和CDx脱附过程。此外，在173 K处观察到了氘注入样品的新氘脱附过程。温度高于室温（RT）。 [参考：9]

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