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首页> 外文期刊>Physica status solidi, B. Basic research >Strain-induced nonlinear behavior of electron effective mass in degenerately doped n-Si(P)under high uniaxial pressure X II [111]
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Strain-induced nonlinear behavior of electron effective mass in degenerately doped n-Si(P)under high uniaxial pressure X II [111]

机译:单轴高X II下简并掺杂n-Si(P)中电子有效质量的应变诱导非线性行为[111]

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[111]. In this paper, the strain-induced nonlinear in-crease of the electron effective mass in degenerately dopedmonocrystalline n-Si(P) was examined by comparison ofthe conductivity change predicted by scaling theory oflocalization and corresponding experimental data on speci-men conductivity change under high uniaxial pressureX ll [111].
机译:[111]。通过比较局域化定标理论预测的电导率变化和相应的高电导率下样品电导率变化的实验数据,研究了简并掺杂单晶n-Si(P)中电子有效质量的应变诱导非线性增加。单轴压力X ll [111]。

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