Phase separation in SiOx films annealed under enhanced hydrostatic pressure

G. Yu. Rudko; I. Yu. Maidanchuk; I. Z. Indutnyy; A. Misiuk; E. G. Gule; P. E. Shepeliavyi

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Phase separation in SiOx films annealed under enhanced hydrostatic pressure

机译：在高压下退火的SiOx薄膜的相分离

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The effect of enhanced hydrostatic pressure (HP, (10-12) × 108 Pa) on thermally stimulated phase decomposition of silicon suboxide layers processed at 450-1000 °C was investigated by infrared spectroscopy and photoluminescence measurements. HP stimulates decomposition of non-stoichiometric SiOx most efficiently at about 450 °C. In spite of enhanced SiOx decomposition, visible photoluminescence appears in HP-treated samples at higher annealing temperatures in comparison to those annealed under ambient pressure (AP, 105 Pa). Contrary to that, application of HP results in essential enhancement of near-infrared emission at lower annealing temperatures as compared to processing under AP. This can be related to pressure-stimulated crystallization of Si inclusions.

机译：通过红外光谱和光致发光测量研究了静水压力（HP，（10-12）×108 Pa）的增加对在450-1000°C下处理的低氧化硅层热激发相分解的影响。 HP在约450°C下最有效地刺激非化学计量SiOx的分解。尽管SiOx分解增强，但与在环境压力（AP，105 Pa）下退火的样品相比，在较高退火温度下，HP处理的样品中仍会出现可见的光致发光。与此相反，与AP处理相比，HP的应用导致在较低的退火温度下实质上增强了近红外发射。这可能与硅夹杂物的压力激发结晶有关。

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《Physica status solidi, B. Basic research》 |2008年第12期|共5页
作者
G. Yu. Rudko; I. Yu. Maidanchuk; I. Z. Indutnyy; A. Misiuk; E. G. Gule; P. E. Shepeliavyi;
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1. Phase separation in SiOx films annealed under enhanced hydrostatic pressure [J] . G. Yu. Rudko, I. Yu. Maidanchuk, I. Z. Indutnyy, Physica status solidi, B. Basic research . 2008,第12期

机译：在高压下退火的SiOx薄膜的相分离
2. Enhancement of the intensity of violet and green photoluminescence from Ge~+ ion-implanted SiO_xN_yfilms caused by hydrostatic pressure during annealing [J] . I.E.Tyschenko, K.S.Zhuravlev, E.N.Vandyshev Optical Materials . 2001,第1a2期

机译：退火过程中静水压力导致Ge〜+离子注入的SiO_xN_y薄膜的紫光和绿光致发光强度增强
3. Solid phase epitaxial re-growth of amorphous layer in Si:Si annealed under enhanced hydrostatic pressure [J] . Bak-Misiuk J., Misiuk A., Barcz A., Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2011,第Null期

机译：静水压力下退火的Si：Si中非晶层的固相外延生长
4. Properties of enhanced hydrostatic pressure-annealed silicon oxynitride films [C] . Wong C. K., Kok C. W., Misiuk A., IEEE International Conference on Electron Devices and Solid-State Circuits . 2008

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5. THE EFFECT OF HYDROSTATIC PRESSURE ON THE ANNEAL OF QUENCHED - IN VACANCIES IN GOLD. [D] . EMRICK, ROY MERTON. 1960

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7. Optical study of thermally induced phase separation in evaporated SiOx films [O] . Indutnyy I.Z., Lisovskyy I.P., Mazunov D.O., 2004

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8. Shelf-Life and Safety Enhancement of Processed Meat by Hydrostatic Pressure in Combination with Moderate Temperature and Biopreservatives, Phase IV [R] . Kalchayanand, N. , Ray, B. , Sikes, A. , 1998

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Phase separation in SiOx films annealed under enhanced hydrostatic pressure

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