Electron-beam lithography

Lloyd Harriott; Alexander Liddle

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Electron-beam lithography

机译：电子束光刻

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摘要

LITHOGRAPHY - literally "stone writing" - is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.

机译：光刻术-从字面上讲是“石刻书写”-是集成电路制造过程中必不可少的过程。正是由于这一过程的改进，在过去的三十年中，微电子领域取得了令人瞩目的进步。

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《Physics world》 |1997年第4期|共5页
作者
Lloyd Harriott; Alexander Liddle;
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正文语种 eng
中图分类物理学;
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专利

1. MicroChannel fabrication via ultraviolet-nanoimprint lithography and electron-beam lithography using an ultraviolet-curable positive-tone electron-beam resist [J] . Microelectronic Engineering . 2020,第Apra期

机译：使用紫外线可固化正性电子束光刻胶，通过紫外-纳米压印光刻和电子束光刻进行微通道制造
2. Deterministic fabrication of circular Bragg gratings coupled to single quantum emitters via the combination of in-situ optical lithography and electron-beam lithography [J] . Kolatschek S., Hepp S., Sartison M., Journal of Applied Physics . 2019,第4期

机译：通过原位光学光刻和电子束光刻相结合的确定性制造与单个量子发射器耦合的圆形布拉格光栅
3. Full-Chip Lithography Verification for Multilayer Structure in Electron-Beam Lithography [J] . Kozo Ogino, Hiromi Hoshino, Hiroshi Arimoto, Japanese journal of applied physics . 2007,第9BPt1期

机译：电子束光刻多层结构的全芯片光刻验证
4. Multiple scattered electron-beam effect in electron-beam lithography [C] . Norio Saitou, Hitachi, Ltd., Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing . 1991

机译：电子束光刻中的多重散射电子束效应
5. Thin-film gated photocathodes for multiple-beam electron-beam lithography. [D] . Pei, Zeting. 2001

机译：用于多束电子束光刻的薄膜栅极光阴极。
6. In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices [O] . Naomi Mizuno, Fernando Camino, Xu Du 2020

机译：像差校正电子束光刻对悬浮石墨烯器件电子传输的影响的原位研究
7. Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography [O] . Tian, Yolan, Isotalo, Tero, Konttinen, Mikko P., 2017

机译：使用电子束光刻和三维激光光刻，用三维聚苯乙烯胶体晶体浸渍金属布线
8. Maskless Electron-Beam Lithography for Trusted Microchip Production. [R] . Lam, D. K. 2016

机译：用于可信赖的microchip生产的无掩模电子束光刻。

Electron-beam lithography

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