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首页> 外文期刊>Physica, B. Condensed Matter >X-ray diffraction under surface acoustic wave excitation
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X-ray diffraction under surface acoustic wave excitation

机译：声表面波激发下的X射线衍射

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The influence of surface acoustic waves (SAW) on grazing incidence diffraction (GID) and high resolution X-ray diffraction in Bragg-geometry (HRXD) was investigated on high-quality YZ-cut LiNbO3 single crystals, alpha(f)-resolved GID-profiles of the (00.6) and the (00.12) reflection as a function of the SAW excitation voltages show both substantial increase of the diffracted intensity (up to 100%) and a simultaneous sharpening of the profiles. Profiles for different incident angles were measured and simulated by model calculations in the framework of dynamical diffraction theory. The lattice displacements induced by the SAW were taken into account by varying the structure factors by an additional Debye-Waller factor. The model calculations agree well with experimental results and serve as an estimate for the amplitude of the longitudinal component of the SAW reaching 0.04 nm for the highest excitation voltage. It is shown that under SAW excitation, the alpha(f)-profile of the weaker (00.12)-reflection can also be calculated using the distorted-wave-Born-approximation, which implies a kinematic description of the scattering process. Under SAW-excitation, the integrated intensity of HRXD profiles of the (30.0) Bragg-reflection increases up to 360% of its original value. This also shows the gain of diffracted intensity caused by reduced extinction. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 22]
机译：研究了高质量YZ切割LiNbO3单晶，α（f）分解的GID的表面声波（SAW）对掠入射衍射（GID）和高分辨X射线衍射在布拉格几何（HRXD）中的影响（00.6）和（00.12）反射的轮廓作为SAW激励电压的函数既显示出衍射强度的显着增加（最高100％），又显示出轮廓的同时锐化。在动力学衍射理论的框架内，通过模型计算来测量和模拟不同入射角的轮廓。通过将结构因子改变一个额外的Debye-Waller因子，可以将SAW引起的晶格位移考虑在内。该模型计算与实验结果非常吻合，并且可以估算出最高激励电压下SAW纵向分量的振幅达到0.04 nm。结果表明，在声表面波激发下，较弱的（00.12）反射的alpha（f）轮廓也可以使用扭曲波的波恩近似来计算，这意味着对散射过程的运动学描述。在声表面波激发下，（30.0）布拉格反射的HRXD轮廓的积分强度增加到其原始值的360％。这也表明了由消光减少引起的衍射强度的增加。 （C）1998 Elsevier Science B.V.保留所有权利。 [参考：22]

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