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首页> 外文期刊>Physica, B. Condensed Matter >Radiation stability of EUV Mo/Si multilayer mirrors
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Radiation stability of EUV Mo/Si multilayer mirrors

机译：EUV Mo / Si多层反射镜的辐射稳定性

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摘要

The stability of Mo/Si multilayer mirrors under extreme ultraviolet (EUV) radiations has been investigated. Mirrors were deposited by DC magnetron sputtering and designed for maximal reflectivity at the wavelength of 13.5 nm. Investigating samples after irradiation by three different EUV sources (Xe-gas discharge, compact laser and X-ray tube), a layer was found on top of mirrors. These contamination layers mainly consisted of oxygen and carbon but with thicknesses depending on the kind of source which was used. A maximal carbon thickness of 45 nm after 210 min of irradiation existed with the compact laser source and a minimal one of 1 nm after 10 h of irradiation was found with the X-ray tube. Furthermore, this deposition process was demonstrated to have a two stages of contamination rates. (C) 2004 Elsevier B.V. All rights reserved.
机译：已经研究了Mo / Si多层反射镜在极端紫外线（EUV）辐射下的稳定性。通过直流磁控溅射沉积反射镜，并设计成在13.5 nm波长处具有最大反射率。在用三种不同的EUV光源（氙气放电，紧凑型激光和X射线管）照射后调查样品，发现在反射镜顶部有一层。这些污染层主要由氧和碳组成，但其厚度取决于所使用的源的种类。在紧凑型激光源照射210分钟后，最大碳厚度为45 nm，而在X射线管照射10 h后，最大碳厚度为1 nm。此外，已证明该沉积过程具有两个阶段的污染率。 （C）2004 Elsevier B.V.保留所有权利。

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