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首页> 外文期刊>Physica, B. Condensed Matter >Structural and morphological studies of Co/SiO2 discontinuous multilayers
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Structural and morphological studies of Co/SiO2 discontinuous multilayers

机译：Co / SiO2不连续多层膜的结构和形态研究

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This work aims to study the structural properties of Co-SiO2 discontinuous multilayers, obtained by magnetron sputtering. Such structure consisting of equally spaced planes of Co aggregates is embedded in a SiO2 matrix. According to the nanostructure, the size of the metallic aggregates and the mean distance between them, the magnetic and transport properties of the discontinuous multilayers can be strongly modified. We used grazing incidence small angle X-ray scattering technique (GISAXS) for the structural and morphological characterisation of metallic aggregates in some selected multilayers, as a function of the metal thickness and annealing conditions after deposition. GISAXS measurements were carried out at the ESRF on ID01 beamline. Below the percolation threshold, we are able to determine the aggregate density by this technique. The in-plane structure of the sample varies with the nominal thickness and annealing up to 400 degrees C seems to have a weak effect on the film characteristics. (C) 2000 Published by Elsevier Science B.V. All rights reserved. [References: 16]
机译：这项工作旨在研究磁控溅射获得的Co-SiO2不连续多层膜的结构性能。这种由等间距分布的Co聚集体组成的结构被嵌入SiO2基质中。根据纳米结构，金属聚集体的大小以及它们之间的平均距离，可以强烈地改变不连续多层的磁性和传输性能。我们使用掠入射小角X射线散射技术（GISAXS）对某些选定多层中的金属聚集体的结构和形态进行了表征，其与金属厚度和沉积后的退火条件有关。 GISAXS测量是在ESRF的ID01光束线上进行的。在渗滤阈值以下，我们能够通过此技术确定聚集密度。样品的面内结构随标称厚度而变化，并且在高达400摄氏度的温度下退火似乎对薄膜特性的影响很小。 （C）2000，Elsevier Science B.V.保留所有权利。 [参考：16]

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