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Diamond Growth on Carbide Surfaces Using a Selective Etching Technique

机译:使用选择性蚀刻技术在硬质合金表面上生长金刚石

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Microwave plasma-enhanced chemical vapor deposition of diamond films on siliconcarbide and tungsten carbide (with 6% cobalt) surfaces using fluorocarbon gases has been demonstrated. No diamond powder pre-treatment is necessary to grow these films with a (100) texture. The diamond films are characterized by scanning electron microscopy and Raman spectroscopy. The proposed nucleation and growth mechanism involves concurrent etching of the non-carbon component by atomic fluorine and deposition of diamond. Hydrogen is necessary in the growth process to limit the rapid etching of the substrate by fluorine atoms.... Diamond growth, Carbide surfaces.

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