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Materials Processing of Diamond: Etching, Doping by Ion Implantation and ContactFormation

机译：金刚石材料加工：蚀刻，离子注入掺杂和接触形成

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A summary of work achieved under this grant is given, including ion implantationdoping of natural diamond, annealing of implantation damage, characterization methods, contact formation using a sputtering method, and plasma etching.

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作者
Swanson, M. L.;
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年度 1992
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总页数 17
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Diamonds; Annealing; Damage; Doping; Etching; Ion implantation; Sputtering;

机译：钻石;退火;损伤;掺杂;蚀刻;离子注入;溅射;

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专利

1. XPS studies on damage evaluation of single-crystal diamond chips processed with ion beam etching and reactive ion beam assisted chemical etching [J] . Yusaku Kawabata, Jun Taniguchi, Iwao Miyamoto Diamond and Related Materials . 2004,第1期

机译：XPS对离子束刻蚀和反应离子束辅助化学刻蚀处理的单晶金刚石芯片损伤评估的研究
2. In situ etching-back processes for a sharper top interface in boron delta-doped diamond structures [J] . Alexandre Fiori, Thu Nhi Tran Thi, Gauthier Chicot Diamond and Related Materials . 2012,第Null期

机译：原位回蚀工艺可在掺硼的金刚石结构中获得更尖锐的顶部界面
3. Investigations on etching resistance of undoped and boron doped polycrystalline diamond films by oxygen plasma etching [J] . Liu Dan, Gou Li, Xu Junjie, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2016,第Null期

机译：氧等离子体刻蚀无掺杂和掺硼多晶金刚石膜的耐蚀性研究
4. Deterministic doping to silicon and diamond materials for quantum processing [C] . Takahiro Shinada, Enrico Prati, Takashi Tanii, International Conference on Nanotechnology . 2016

机译：确定性掺杂硅和金刚石材料以进行量子处理
5. From Materials to Devices: (I) Ultrathin Flexible Implantable Bio-probes with Biodegradable Sacrificial Layers (II) Carrier Spin Injection and Transport in Diamond [D] . Jiao, Xiangbing. 2018

机译：从材料到设备：（I）具有可生物降解牺牲层的超薄柔性可植入生物探针（II）金刚石的自旋注入和运输
6. Investigation of low-resistivity from hydrogenated lightly B-doped diamond by ion implantation [O] . Cui Xia Yan, Ying Dai, Meng Guo, 2008

机译：通过离子注入研究氢化轻掺杂B掺杂金刚石的低电阻率
7. Realizing the diamond annular groove phase masks for the mid infrared region: five years of successful process development of diamond plasma etching [O] . Forsberg, Pontus, Vargas Catalan, Ernesto, Delacroix, Christian, 2014

机译：实现中红外区域的金刚石环形凹槽相位掩模：金刚石等离子蚀刻成功开发工艺的五年
8. Materials Processing of Diamond: Etching, Doping by Ion Implantation and ContactFormation [R] . Swanson, M. L. 1990

机译：金刚石材料加工：蚀刻，离子注入掺杂和接触形成

Materials Processing of Diamond: Etching, Doping by Ion Implantation and ContactFormation

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