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Selective Processing Techniques for Electronic and Optoelectronic Applications: Quantum-Well Devices and Integrated Optic Circuits

机译:电子和光电应用的选择性处理技术:量子阱器件和集成光学电路

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This program had two objectives: to develop selective material processing techniques for both multiple quantum well (MQW) electronic devices and circuits, and to develop design and fabrication techniques for advanced photonic devices and circuits. The ULTRA electronics portion of the program was focused on developing new damage free etching techniques for nanoscale semiconductor electronic devices; techniques primarily for III-V semiconductors were of interest. The photonics program considered a wide range of materials for photonic integrated devices (PICs) with an emphasis on prototyping methods and novel devices. The successes of the program included new integrated devices, laser prototyping techniques, new design software, and a new fabrication method for single crystal metal oxides. Technology transfer was realized to two industrial partners.

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