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Wafer cost analysis for a soft x-ray projection lithography system.

机译：软X射线投影光刻系统的晶圆成本分析。

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We present a baseline analysis of issues affecting the economic viability of Soft X-ray Projection Lithography (SXPL). This analysis is intended to serve as a starting point, and provide an initial assessment of the relative importance of cost factors in ...

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作者
N. M. Ceglio A. M. Hawryluk;
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年度 1991
页码 1-26
总页数 26
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Cost Estimation; Design; Economics; EDB/360601; EDB/420200; EDB/426000; Fabrication; Integrated Circuits; Laser Mirrors; Meetings; Optical Systems; Reflectivity; Soft x rays; SXPL system; Wafers; X ray lithography; X-Ray Sources;

机译：成本估算;设计;经济学; EDB / 360601; EDB / 420200; EDB / 426000;制造;集成电路;激光反射镜;会议;光学系统;反射率;软x射线; sXpL系统;晶圆; X射线光刻; X射线来源;

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2. Development of laser-plasma soft X-ray source for projection lithography [J] . Y.Nishimura, A.Sakata 表面科学 . 1999,第3期

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3. Development of laser-plasma soft X-ray source for projection lithography [J] . Y.Nishimura, A.Sakata 表面科学 . 1999,第3期

机译：投影光刻用激光等离子软X射线源的研制
4. Soft x-ray projection lithography system design and cost analysis [C] . Natale M. Ceglio, Andrew M. Hawryluk Conference on multilayer optics for advanced x-ray applications . 1992

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5. Brachytherapy seed and applicator localization via iterative forward projection matching algorithm using digital X-ray projections. [D] . Pokhrel, Damodar. 2010

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6. Additive Nano-Lithography with Focused Soft X-rays: Basics Challenges and Opportunities [O] . Andreas Späth 2019

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7. Laser-induced Plasma X-ray Source and Its Applications. Development of Laser-plasma Soft X-ray Source for Projection Lithography. [O] . Yasuhiko NISHIMURA, Atsushi SAKATA, Hirozumi AZUMA 1999

机译：激光诱导等离子体X射线源及其应用。投影光刻激光等离子软X射线源的研制。
8. Soft x-ray projection lithography system design and cost analysis. [R] . N. M. Ceglio A. M. Hawryluk 1991

机译：软X射线投影光刻系统设计和成本分析。

Wafer cost analysis for a soft x-ray projection lithography system.

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