首页> 美国政府科技报告 >AES (Auger Electron Spectroscopy) and EELS (Electron Energy Loss Spectroscopy) Analysis of TlBaCaCuO(sub X) Thin Films at 300 K and at 100 K
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AES (Auger Electron Spectroscopy) and EELS (Electron Energy Loss Spectroscopy) Analysis of TlBaCaCuO(sub X) Thin Films at 300 K and at 100 K

机译:在300 K和100 K下的TlBaCaCuO(sub X)薄膜的aEs(俄歇电子能谱)和EELs(电子能量损失光谱)分析

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Auger electron spectroscopy line-shape analysis of the Tl(NOO), Ba(MNN), Ca(LMM), Cu(LMM) and O(KLL) peaks has been performed in conjunction with electron energy loss spectroscopy (EELS) on magnetron sputter deposited TlBaCaCuO/sub x/ thin films exhibiting a superconducting onset at 110K with zero resistance at 96K. AES and EELS analyses were performed at 300K and at 100K. Changes in the Auger line shapes and in the EELS spectra as the temperature is lowered below the critical point are related to changes in the electronic structure of states in the valence band (VB). Bulk and surface plasmon peaks are identified in the EELS spectra along with features due to core level transitions. Electron beam and ion beam induced effects are also addressed. 13 refs., 3 figs., 1 tab. (ERA citation 14:015249)

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