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Chemical Vapor Deposition of Zirconium Carbide onto Ceramic Substrates

机译：碳化锆在陶瓷基体上的化学气相沉积

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摘要

Zirconium carbide is an attractive ceramic material due to its unique properties such as high melting point, good thermal conductivity, and chemical resistance. The controlled preparation of zirconium carbide films of superstoichiometric, stoichiometric, and substoichiometric compositions has been achieved utilizing zirconium tetrachloride and methane precursor gases in an atmospheric pressure high temperature chemical vapor deposition system.

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作者
Glass, J. A. ; Palmisiano, N. ; Welsh, R.;
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年度 1999
页码 1-9
总页数 9
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Zirconium carbide; Chemical vapor deposition; Meetings; Ceramics; Substrates; Materials tapes;

机译：碳化锆;化学气相沉积;会议;陶瓷;基材;材料带;

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专利

1. Computational study on the decomposition of tetraneopentyl zirconium for the chemical vapor deposition of zirconium carbide [J] . Yong Sun Won The Korean journal of chemical engineering . 2012,第10期

机译：碳化四刚戊基锆分解用于化学气相沉积的计算研究
2. Wear improvements of stainless steel and tungsten carbide substrates covered by thin carbon film combining ion beam assisted deposition and plasma enhanced chemical vapor deposition from pure CH{sub}4 deposition methods [J] . H. Gonnord, M. Jaouen, J. Delafond, Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear . 1999,第1期

机译：纯CH {sub} 4沉积方法结合离子束辅助沉积和等离子增强化学气相沉积，改善了碳膜覆盖的不锈钢和碳化钨基底的磨损
3. Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition [J] . Qiaoinu Liu, Litong Zhang, Laifei Cheng, Journal of coatings technology and research . 2009,第2期

机译：化学气相沉积碳化锆薄膜的形貌和生长机理
4. The chemical vapor deposition of zirconium carbide onto creamic substrates [C] . John A.Glass, Nick Palmisiano, R.Edward Welsh Symposium on properties and processing of vapor-deposited coatings . 1999

机译：碳化锆的化学气相沉积在奶油基材上
5. An investigation of the mechanical and physical issues of the adhesion of chemically vapor deposited (CVD) diamond coatings on cemented carbide cutting tool inserts (Cemented carbide tools, Chemical vapor deposition). [D] . Taher, Mahmoud Abdelfattah. 1999

机译：研究硬质合金切削刀具刀片（硬质合金刀具，化学气相沉积）上化学气相沉积（CVD）金刚石涂层的附着力的机械和物理问题。
6. Iron-Intercalated Zirconium Diselenide Thin Filmsfrom the Low-Pressure Chemical Vapor Deposition of Fe(η5-C5H4Se)2Zr(η5-C5H5)22 [O] . Clara Sanchez-Perez, Caroline E. Knapp, Ross H. Colman, 2020

机译：铁嵌入二硒化锆薄膜Fe（η5-C5H4Se）2Zr（η5-C5H5）2 2的低压化学气相沉积法制备
7. The Chemical Vapor Deposition of Zirconium Carbide onto Ceramic Substrates [O] . John A. Glass, Nick Palmisiano, R. Edward Welsh 1998

机译：碳化锆的化学气相沉积在陶瓷基材上

Chemical Vapor Deposition of Zirconium Carbide onto Ceramic Substrates

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