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Optical cleanliness specifications and cleanliness verification

机译：光学清洁度规范和清洁度验证

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Optical cleanliness is important to NIF because it results in beam obscuration211u001eand scatter losses which occur in the front-end (containing over 20,000 small 211u001eoptics) and the large-aperture portions of the laser (containing 7,300 optics in 211u001e192 beamlines). The level of particulate cleanliness necessary for NIF, is 211u001esimilar to the scatter loss due to surface roughness. That is, the scatter loss 211u001eshould not exceed 2.5 x 10(sup (minus)5) per surface. Establishing requirements 211u001efor optical and structural surface cleanliness needs consideration of both 211u001eparticulate and organic thin-film cleanliness. Both forms of cleanliness may be 211u001especified using guidelines specified in Military Standard 1246C and are referred 211u001eto as cleanliness Levels. This Military Standard is described briefly and 211u001edisplayed in tables and charts. The presence of organic thin-films on structural 211u001esurfaces is of particular concern if the contaminated surface is near solgel 211u001ecoated optics (solgel coatings provide an antireflection (AR) quality); or the 211u001eoptic is in a vacuum. In a vacuum, organic contaminant molecules have a much high 211u001eprobability of transporting from their source to a solgel-coated optic and 211u001ethereby result in the rapid change in the transmission of the antireflection 211u001ecoating. Optical surface cleanliness can be rapidly degraded if a clean optic is 211u001eexposed to any atmosphere containing an aerosol of small particles. The use of 211u001ecleanrooms, as described in Federal Standard 209C, minimizes the settling of 211u001eparticulate contaminants and is described using charts and tables. These charts 211u001eassist in determining the obscuration and scatter loss that can be expected when 211u001ea clean surface is exposed to various Classes of cleanrooms due to particulate 211u001esettling.

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