首页> 美国政府科技报告 >Friction and Hardness of Gold Films Deposited by Ion Plating and Evaporation

【24h】

Friction and Hardness of Gold Films Deposited by Ion Plating and Evaporation

机译：离子镀和蒸发沉积金膜的摩擦和硬度

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

Sliding friction experiments were conducted with ion-plated and vapor-deposited gold films on various substrates in contact with a 0.025-mm-radius spherical silicon carbide rider in mineral oil. Hardness measurements were also made to examine the hardness depth profile of the coated gold on the substrate. The results indicate that the hardness is influenced by the depth of the gold coating from the surface. The hardness increases with an increase in the depth. The hardness is also related to the composition gradient in the graded interface between the gold coating and the substrate. The graded interface exhibited the highest hardness resulting from an alloy hardening effect. The coefficient of friction is inversely related to the hardness, namely, the load carrying capacity of the surface. The greater the hardness that the metal surface possesses, the lower is the coefficient of friction. The graded interface exhibited the lowest coefficient of friction.

著录项

作者
Miyoshi, K.; Spalvins, T.; Buckley, D. H.;
展开▼
作者单位

展开▼
年度 1983
页码 p.1-10
总页数 10
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Evaporation; Gold; Hardness; Ion plating; Metal films; Sliding friction; Coatings; Coefficient of friction; Substrates;

机译：蒸发;金;硬度;离子镀;金属薄膜;滑动摩擦;涂层;摩擦系数;基板;

相似文献

外文文献
中文文献
专利

1. Effects of Pulse Bias Duty Cycle on Composition, Structure and Hardness of Ti-Cu-N Nanocomposite Films Deposited by Pulse Biased Arc Ion Plating [J] . Wang W., Zhao Y. H., Fu Z. B., Materials transactions . 2015,第10期

机译：脉冲偏压占空比对脉冲偏压电弧离子镀Ti-Cu-N纳米复合膜组成，结构和硬度的影响
2. Oxidation resistance and hardness of TiAlSiN/CrAlYN multilayer films deposited by the arc ion plating method [J] . Mori T., Noborisaka M., Watanabe T., Surface & Coatings Technology . 2012,第Null期

机译：电弧离子镀法沉积TiAlSiN / CrAlYN多层膜的抗氧化性和硬度
3. Friction and wear properties of CrAlN and CrVN films deposited by cathodic arc ion plating method [J] . Uchida M., Nihira N., Mitsuo A., Surface & Coatings Technology . 2004,第0期

机译：阴极电弧离子镀法沉积CrAlN和CrVN薄膜的摩擦磨损性能
4. Relationships Between Hardness, Critical Load and Stoichiometry of Chromium Nitride Thin Films Deposited by Cathodic Arc Evaporation [C] . A. M. Peters, J. J. Moore, B. Mishra, International conference on surface modification technologies . 1998

机译：阴极电弧蒸发沉积氮化铬薄膜的硬度，临界载荷与化学计量关系
5. The structure and composition of an electroplated gold-tin solder alloy co-deposited by pulse plating from solutions containing ethylendiamine as a stabilizer [D] . Doesburg, Jacobus Cornelis 2000

机译：通过脉冲电镀法从含有乙二胺作为稳定剂的溶液中共沉积的电镀金锡焊料合金的结构和组成
6. Relation between electrical properties of aerosol-deposited BaTiO3 thin films and their mechanical hardness measured by nano-indentation [O] . Hong-Ki Kim, Jong-Min Oh, Soo In Kim, 2012

机译：纳米压痕法测量气溶胶沉积BaTiO3薄膜的电学性质与其机械硬度之间的关系
7. Effects of Pulse Bias Duty Cycle on Composition, Structure and Hardness of Tindash;Cundash;N Nanocomposite Films Deposited by Pulse Biased Arc Ion Plating [O] . W. Wang, Y. H. Zhao, Z. B. Fu, 2015

机译：脉冲偏置循环对脉冲偏置电弧离子镀层沉积的Ti-Cu-N纳米复合膜的组成，结构和硬度的影响
8. Friction and hardness of gold films deposited by ion plating and evaporation [R] . Miyoshi, K., Spalvins, T., Buckley, D. H. 1983

机译：通过离子镀和蒸发沉积的金膜的摩擦和硬度

Friction and Hardness of Gold Films Deposited by Ion Plating and Evaporation

摘要

著录项

相似文献

相关主题

期刊订阅