Method and Apparatus for Maskless Photolithography.

机译：无掩模光刻的方法和装置。

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摘要

A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three dimensional structure. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce gray scale patterns to photoform layers of continuously variable thickness. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. A fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. The fixture can be rotated in one, two, or three directions.

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作者
Fries, D. P.;
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年度 2003
页码 1-27
总页数 27
原文格式 PDF
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中图分类
关键词
Photolithography; Patent applications; Apparatus; Dimensions; Patterns; Positioning; Mirrors; Exposure; Thickness; Computer aided design; Substrates; Maskless photolithography;

机译：光刻;专利申请;仪器;尺寸;图案;定位;镜子;曝光;厚度;计算机辅助设计;基板;无掩模光刻;

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Method and Apparatus for Maskless Photolithography.

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