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Control of the Gas Flow in an Industrial Directional Solidification Furnace for Production of High Purity Multicrystalline Silicon Ingots

机译:用于生产高纯度多晶硅锭的工业定向凝固炉中气流的控制

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摘要

A crucible cover was designed as gas guidance to control the gas flow in an industrial directional solidification furnace for producing high purity multicrystalline silicon. Three cover designs were compared to investigate their effect on impurity transport in the furnace and contamination of the silicon melt. Global simulations of coupled oxygen (O) and carbon (C) transport were carried out to predict the SiO and CO gases in the furnace as well as the O and C distributions in the silicon melt. Cases with and without chemical reaction on the cover surfaces were investigated. It was found that the cover design has little effect on the O concentration in the silicon me however, it significantly influences CO gas transport in the furnace chamber and C contamination in the melt. For covers made of metal or with a coating on their surfaces, an optimal cover design can produce a silicon melt free of C contamination. Even for a graphite cover without a coating, the carbon concentration in the silicon melt can be reduced by one order of magnitude. The simulation results demonstrate a method to control the contamination of C impurities in an industrial directional solidification furnace by crucible cover design.
机译:坩埚罩被设计成气体引导控制在工业定向凝固炉中的气体流用于生产高纯度多晶硅。三个封面设计进行比较,以探讨其在硅熔液的熔炉和污染杂质的运输效果。耦合氧(O)和碳(C)的运输全球模拟进行了预测在炉以及O和C分布在硅熔体中在SiO和CO气体。具有和不具有盖子表面上的化学反应的情况下进行了研究。结果发现,在盖设计对在硅熔体将O浓度的影响很小;然而,它显著影响在炉腔和C污染在熔体CO气体运输。用于由金属制成的或在其表面上的涂层覆盖,最佳的盖设计可产生硅熔体游离C污染。即使对于没有涂层的石墨盖,在硅中的碳浓度熔体可以通过一个数量级减少。仿真结果表明,以控制在由坩埚盖设计的工业定向凝固炉的Ç杂质污染的方法。

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