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Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

机译：氧化石墨烯单层作为原子薄的种子层，用于金属氧化物的原子层沉积

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status: published

机译：状态：已发布

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Nourbakhsh Amirhasan; Adelmann Christoph; Song Yi; Lee Chang Seung; Asselberghs Inge; Huyghebaert Cedric; Brizzi Simone; Tallarida Massimo; Schmeisser Dieter; Van Elshocht Sven; Heyns Marc; Kong Jing; Palacios Tomas; De Gendt Stefan;
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1. Seed‐Layer‐Free Atomic Layer Deposition of Highly Uniform Al ₂2 O ₃3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide [J] . Schilirò Emanuela, Lo Nigro Raffaella, Roccaforte Fabrizio, Advanced materials interfaces . 2019,第10期

机译：高度均匀的种子 - 无均匀原子层沉积 _{2 2 O. _{3 3 薄膜在碳化硅上的单层外延石墨烯上}}
2. Ultrathin Al Oxide Seed Layer for Atomic Layer Deposition of High-κ Al2O3 Dielectrics on Graphene [J] . Hang Yang, Wei Chen, Ming-Yang Li, 中国物理快报：英文版 . 2020,第007期

机译：石墨烯上高κAl2O3电介质原子层沉积的超薄氧化铝种子层
3. Selective atomic layer deposition of metal oxide thin films on patterned self-assembled monolayers formed by microcontact printing [J] . Lee BH, Sung MM Journal of nanoscience and nanotechnology . 2007,第11期

机译：金属氧化物薄膜在通过微接触印刷形成的图案化自组装单分子层上的选择性原子层沉积
4. Passivation of Defects in Macroscopic Graphene Sheets Via Selective Atomic Layer Deposition of Metal Oxides [C] . Michael F. Mazza, Annelise C. Thompson, Miguel Caban-Acevedo, Meeting of the Electrochemical Society;International Meeting on Chemical Sensors . 2020

机译：通过选择性原子层沉积金属氧化物的选择性原子层沉积在宏观石墨烯片中的钝化钝化
5. Modification of semi-metal oxide and metal oxide powders by atomic layer deposition of thin films. [D] . Snyder, Mark Q. 2007

机译：通过薄膜的原子层沉积对半金属氧化物和金属氧化物粉末进行改性。
6. ParameterSpace of Atomic Layer Deposition of Ultrathin Oxides on Graphene [O] . Adrianus I. Aria, Kenichi Nakanishi, Long Xiao, -1

机译：参数石墨烯上超薄氧化物原子层沉积的空间
7. Seed‐Layer‐Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide [O] . Emanuela Schilirò, Raffaella Lo Nigro, Fabrizio Roccaforte, 2019

机译：将高度均匀的Al 2 O 3薄膜的种子层的原子层沉积在碳化硅上的单层外延石墨烯上

Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

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