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首页> 外文OA文献 >Copper and iron based thin film nanocomposites prepared by radio frequency sputtering. Part I: elaboration and characterization of metal/oxide thin film nanocomposites using controlled in situ reduction process
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Copper and iron based thin film nanocomposites prepared by radio frequency sputtering. Part I: elaboration and characterization of metal/oxide thin film nanocomposites using controlled in situ reduction process

机译：通过射频溅射制备的铜和铁基薄膜纳米复合材料。第一部分：使用可控的原位还原工艺精制和表征金属/氧化物薄膜纳米复合材料

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摘要

Copper and iron based thin films were prepared on glass substrate by radio-frequency sputtering technique from a delafossite CuFeO2 target. After deposition, the structure and microstructure of the films were examined using grazing incidence X-ray diffraction, Raman spectroscopy, electron probe micro-analysis and transmission electron microscopy coupled with EDS mapping. Target to substrate distance and sputtering gas pressure were varied to obtain films having different amount and distribution of copper nanoparticles and different composition of oxide matrix. The overall reaction process, which starts from CuFeO2 target and ends with the formation of films having different proportion of copper, copper oxide and iron oxide, was described by a combination of balanced chemical reactions. A direct relationship between the composition of the metal/oxide nanocomposite thin film and the sputtering parameters was established. This empirical relationship can further be used to control the composition of the metal/oxide nanocomposite thin films, i.e. the in situ reduction of copper ions in the target.
机译：以铜铁矿CuFeO2为靶材，通过射频溅射技术在玻璃基板上制备了铜铁基薄膜。沉积后，使用掠入射X射线衍射，拉曼光谱，电子探针显微分析和透射电子显微镜以及EDS作图，检查薄膜的结构和微观结构。改变靶到衬底的距离和溅射气压，以获得具有不同数量和分布的铜纳米颗粒和不同组成的氧化物基质的膜。通过平衡化学反应的组合描述了整个反应过程，该过程始于CuFeO2靶，最后形成具有不同比例的铜，氧化铜和氧化铁的膜。建立了金属/氧化物纳米复合薄膜的组成与溅射参数之间的直接关系。该经验关系还可用于控制金属/氧化物纳米复合薄膜的组成，即靶中铜离子的原位还原。

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