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Hole mobility enhancement and p-doping in monolayer WSe2 by gold decoration

机译:通过金装饰增强单层WSe2中的空穴迁移率和p掺杂

摘要

Tungsten diselenide (WSe2) is an attractive transition metal dichalcogenide material, since its Fermi energy close to the mid gap makes it an excellent candidate for realizing p-n junction devices and complementary digital logic applications. Doping is one of the most important technologies for controlling the Fermi energy in semiconductors, including 2D materials. Here we present a simple, stable and controllable p-doping technique on a WSe2 monolayer, where a more p-typed WSe2 field effect transistor is realized by electron transfer from the WSe2 to the gold (Au) decorated on the WSe2 surfaces. Related changes in Raman spectroscopy are also reported. The p-doping caused by Au on WSe2 monolayers lowers the channel resistance by orders of magnitude. The effective hole mobility is ~100 (cm2/Vs) and the near ideal subthreshold swing of ~60 mV/decade and high on/off current ratio of >106 are observed. The Au deposited on the WSe2 also serves as a protection layer to prevent a reaction between the WSe2 and the environment, making the doping stable and promising for future scalable fabrication.
机译:二硒钨(WSe2)是一种有吸引力的过渡金属二卤化钨材料,因为其费米能量接近中间隙,使其成为实现p-n结器件和互补数字逻辑应用的极佳候选者。掺杂是控制半导体(包括2D材料)中费米能量的最重要技术之一。在这里,我们介绍了一种在WSe2单层上的简单,稳定和可控的p掺杂技术,其中,通过将电子从WSe2转移到装饰在WSe2表面上的金(Au),可以实现更p型的WSe2场效应晶体管。还报道了拉曼光谱的相关变化。 WSe2单层上Au引起的p掺杂将沟道电阻降低了几个数量级。有效空穴迁移率为〜100(cm2 / Vs),观察到接近理想的亚阈值摆幅为〜60 mV /十倍,高通/断电流比> 106。沉积在WSe2上的Au还用作保护层,以防止WSe2与环境之间的反应,使掺杂稳定并有望用于将来的可扩展制造。

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