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Illumination optics for EUV projection lithography
Illumination optics for EUV projection lithography
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机译：EUV投影光刻的照明光学器件
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摘要
An illumination optics (6) for EUV projection lithography has a field facet mirror (FF) with a plurality of field facets for guiding partial illuminating light bundles along an illuminating light beam path into an object field (4) in which a lithography mask (10) can be arranged. A transmission optics (17) of the illumination optics (6) are used to superimpose the field facets in the object field (4). The transmission optics (17) has exactly three mirrors, namely a further facet mirror (PF) with transmission facets for the individual guidance of the partial illuminating light bundles and two mirrors (18, 19) arranged downstream thereof in the illuminating light beam path, namely a first telescopic mirror (18) and a second telescopic mirror (19). The transmission optics (17) are designed such that at least one intermediate image (20) is created in the illuminating light beam path between the field facet mirror (FF) and the object field (4). The result is an illumination optics in which an influencing of an illumination intensity on the object field provided by the illumination optics is ensured as independently as possible of the location on the object field.
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