首页> 外国专利> PDMS PDMS PDMS thin film having a lattice patterning structure for improving radiative cooling effect and method for producing the PDMS thin film

PDMS PDMS PDMS thin film having a lattice patterning structure for improving radiative cooling effect and method for producing the PDMS thin film

机译:具有改善辐射冷却效果的晶格图案结构的PDMS PDMS PDMS薄膜及其制造方法

摘要

According to the present invention, a PDMS thin film having a lattice patterning structure for enhancing a radiation cooling effect and a method of manufacturing the PDMS thin film include: attaching a PET substrate on a first base substrate; Depositing a PR photoresist on the PET substrate through spin coating and patterning the PR photoresist; Forming an upper PDMS assembly by spin coating PDMS on the patterned PR photoresist; Depositing an Ag forming layer on a second base substrate and spin coating PDMS on the Ag forming layer to form a lower PDMS assembly; Combining the upper PDMS assembly and the lower PDMS assembly to complete one integrated final PDMS assembly; And removing the PET substrate at the same time as removing the PR photoresist on the final PDMS assembly.
机译:根据本发明,具有用于增强辐射冷却效果的晶格图案结构的PDMS薄膜及其制造方法包括:在第一基础基板上附着PET基板;以及将PET基板附着在第一基板上。通过旋涂将PR光致抗蚀剂沉积在PET基板上并图案化PR光致抗蚀剂;通过在图案化的PR光刻胶上旋涂PDMS来形成上部PDMS组件;在第二基础基板上沉积Ag形成层,并在Ag形成层上旋涂PDMS以形成下部PDMS组件;将上部PDMS组件和下部PDMS组件组合在一起,以完成一个集成的最终PDMS组件;在去除最终PDMS组件上的PR光刻胶的同时,去除PET基板。

著录项

  • 公开/公告号KR102153946B1

    专利类型

  • 公开/公告日2020-09-09

    原文格式PDF

  • 申请/专利权人 한국과학기술원;

    申请/专利号KR20180146428

  • 发明设计人 이봉재;이승윤;송재만;

    申请日2018-11-23

  • 分类号G03F7/20;G03F7;G03F7/16;G03F7/26;

  • 国家 KR

  • 入库时间 2022-08-21 11:03:50

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号