首页> 外国专利> - TFTThin Film Transistor Based on Graphine Comprising N-Dopped Graphine Layer as Active Layer

- TFTThin Film Transistor Based on Graphine Comprising N-Dopped Graphine Layer as Active Layer

机译:-基于石墨烯的N掺杂石墨烯层作为有源层的TFT薄膜晶体管

摘要

The present invention relates to a high-quality, high-functional graphene-based TFT comprising a nitrogen-doped graphene layer as an active layer, and more particularly, a gate electrode; A gate insulating layer positioned on the gate electrode; An active layer positioned on a portion of the gate insulating layer and including a nitrogen-doped graphene layer; A first electrode positioned on one side of the active layer; It relates to a graphene-based TFT including; a second electrode positioned on the other side of the active layer. According to the present invention, a TFT having very excellent characteristics can be obtained by directly growing graphene on a Ti layer, damaging it with a remote plasma, and then doping it with nitrogen gas to prepare a graphene active layer.
机译:本发明涉及一种高质量,高功能的基于石墨烯的TFT,其包括掺杂氮的石墨烯层作为活性层,更具体地讲,是栅电极。位于栅电极上的栅绝缘层;有源层位于栅极绝缘层的一部分上,并包括氮掺杂石墨烯层;第一电极位于有源层的一侧;本发明涉及一种石墨烯基TFT,包括:第二电极位于有源层的另一侧。根据本发明,通过在Ti层上直接生长石墨烯,用远端等离子体对其进行损伤,然后用氮气掺杂以制备石墨烯活性层,可以获得具有非常优异的特性的TFT。

著录项

  • 公开/公告号KR20200101714A

    专利类型

  • 公开/公告日2020-08-28

    原文格式PDF

  • 申请/专利权人 충남대학교산학협력단;

    申请/专利号KR20190019924

  • 发明设计人 윤순길;박병주;한이레;

    申请日2019-02-20

  • 分类号H01L29/786;H01L21/324;H01L29/16;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:08

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