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METHOD OF SURFACE TEXTURING USING A LASER HEATING STEP THAT CONTRIBUTES TO SMALL-SIZED TEXTURE MORPHOLOGY
METHOD OF SURFACE TEXTURING USING A LASER HEATING STEP THAT CONTRIBUTES TO SMALL-SIZED TEXTURE MORPHOLOGY
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机译:使用激光加热步骤进行表面纹理化的方法,该方法有助于缩小纹理形态
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摘要
The invention is related to a method for surface texturing of a silicon wafer where a laser irradiation step is used. The laser irradiation step produces a smooth surface of the silicon wafer due to silicon melting and recrystallizing of the silicon at said surface, wherein the laser irradiation step is followed by a texturing process step which is carried out onto the smooth surface of the silicon wafer to obtain a textured surface of the silicon wafer.
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