PROBLEM TO BE SOLVED: To provide an imprint device advantageous in suppression of occurrence of a pattern defect.;SOLUTION: An imprint device which is hardened by applying light to an unhardened imprint member R in a state where the unhardened imprint member R on a substrate W and a mold M are contacted, and in which a pattern of the hardened imprint member R is formed to the substrate W, includes: a mold holding part 120 that holds the mold M; a supply part 130 that supplies the unhardened imprint member R onto the substrate W; a support part 101 that supports the mold holding part 120 and the supply part 130; and an irradiation part 150 that applies light to a surface 301 on the side opposite to the substrate W of the front surface of the mold holding part 120 and the support part 101.;SELECTED DRAWING: Figure 5;COPYRIGHT: (C)2019,JPO&INPIT
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