首页>
外国专利>
X-ray diffraction measurement system and X-ray diffraction measurement system
X-ray diffraction measurement system and X-ray diffraction measurement system
展开▼
机译：X射线衍射测量系统和X射线衍射测量系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a small and simple structure of an X-ray diffraction measuring apparatus for irradiating a measurement object flowing on a transport line with X-rays at a plurality of incident angles and obtaining a residual stress by a sin 2ψ method. A plurality of X-ray diffraction measurement devices 1-1 to 1-4 are arranged along the moving direction of a transport line LN. The X-ray diffraction measurement apparatuses 1-1 to 1-4 arrange the X-ray tube so that the central axis is substantially parallel to the plane of the measurement object OB and substantially perpendicular to the moving direction of the transport line LN. The angle formed by the reference plane including the central axis of the X-ray and the optical axis of the emitted X-ray is different from the plane of the measurement object OB, and the line connecting the X-ray irradiation points coincides with the moving direction of the transport line LN To be positioned. The X-ray diffractometers 1-1 to 1-4 use an X-ray imager when the light receiving plane is substantially perpendicular to the reference plane and diffracted X-rays are generated at a standard diffraction angle. It arrange | positions so that the peak in the X-ray intensity distribution on the line to perform may become a predetermined position. [Selection] Figure 2
展开▼
