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WAFER TRANSFER MECHANISM, WAFER PROBER AND TRANSFER POSITION ADJUSTING METHOD FOR WAFER TRANSFER MECHANISM

机译:晶片转移机理的晶片转移机理,晶片探针和转移位置调整方法

摘要

To provide a wafer transfer mechanism for positioning a wafer to be placed on a stage by correcting positional displacement of the wafer in a delivery process of the wafer.SOLUTION: A wafer transfer mechanism is configured to deliver a wafer onto a stage which comprises a placement surface and is capable of placing the wafer on the placement surface. The wafer transfer mechanism comprises multiple lift pins each of which is disposed outside of an outer edge of the placement surface of the stage and delivers the wafer at a transfer position at an upper side of the stage by being vertically driven while supporting a rear face of the wafer having a diameter that is larger than the stage. Each of the lift pins includes: a supporting surface which is provided in parallel with the placement surface of the stage and supports the wafer in contact with a rear face of a rim part that is provided in an outer periphery of the wafer; a vertical surface which is positioned outside of the outer edge of the wafer supported on the supporting surface, and provided vertically to the supporting surface; and an inclined surface which is positioned at an upper side of the vertical surface and provided while being inclined upwards from a center of the stage to the outside.SELECTED DRAWING: Figure 1
机译:为了提供一种晶片传送机构,该晶片传送机构用于通过在晶片的传送过程中校正晶片的位置位移来将要放置在其上的晶片定位。解决方案:晶片传送机构被配置为将晶片传送到包括放置的载物台上表面并且能够将晶片放置在放置表面上。晶片传送机构包括多个升降销,每个升降销布置在平台的放置表面的外边缘的外侧,并且通过在支撑平台的后表面的同时被垂直驱动而在平台的上侧的传送位置处传送晶片。晶片的直径大于载物台的直径。每个提升销包括:支撑表面,其平行于平台的放置表面设置,并且支撑晶片以与设置在晶片的外周中的边缘部分的背面接触;垂直表面,该垂直表面位于被支撑在支撑表面上的晶片的外边缘的外侧,并且垂直于支撑表面设置;图1是从载物台的中心向外部向上倾斜的倾斜面,该倾斜面位于垂直面的上侧。

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